11. The switching threshold voltage VTH for an ideal inverter is equal to:
A. (VDD-VOL)/2
B. VDD
C. (VDD)/2
D. 0
12. The electrical equivalent component for MOS structure is:
A. Resistor
B. Capacitor
C. Inductor
D. Switch
13. The Fermi potential is the function of:
A. Temperature
B. Doping concentration
C. Difference between Fermi level and intrinsic Fermi level
D. All of the mentioned
14. The direction of the electric field when the gate voltage is zero:
A. Metal to semiconductor
B. Semiconductor to metal
C. No electric field exists
D. None of the mentioned
15. Consider a MOS structure with equilibrium Fermi potential of the doped silicon substrate is given as 0.3eV. The electron affinity of Si is 4.15eV and metal is 4.1eV. Find the built-in potential of the MOS system.
A. -0.8eV
B. 0.8eV
C. 0.9eV
D. -0.9eV
16. When the gate voltage is negative for enhancement mode n-MOS, the direction of the electric field will be:
A. Metal to semiconductor
B. Semiconductor to metal
C. No field exists
D. None of the mentioned
17. At threshold Voltage, the surface potential is:
A. Fermi potential
B. Fermi potential
C. 2 Fermi potential
D. -2 Fermi potential
18. Surface inversion occurs when the gate voltage is:
A. Less than zero
B. Less than the threshold voltage
C. Equal to the threshold voltage
D. Greater than the threshold voltage
19. For enhancement mode n-MOSFET, the threshold voltage is:
A. Equal to 0
B. Greater than zero or Positive quantity
C. Negative voltage or lesser than zero
D. All of the mentioned
20. The threshold voltage depends on:
A. The work function difference between gate and channel
B. The gate voltage component to change surface potential
C. The gate voltage component to offset the depletion charge and fixed charges in gate oxide
D. All of the mentioned