21. By what amount is Sidewall doping larger than substrate doping concentration.
A. 5
B. 2
C. 1
D. 10
22. Zero bias depletion capacitance per unit length at sidewall junctions is given by, (Cj is the zero bias depletion capacitance per unit area.
A. (√10).Cj.xj
B. (√5).Cj.xj
C. (√10).Cj.xj2
D. (√10).Cj.xj3
23. The typical value of capacitance in pF × 10-4/µm2 for gate to channel in λ based design is?
A. 1
B. 0.4
C. 0.2
D. 4
24. The active capacitance is also called as __________
A. Parasitic capacitance
B. Interconnect capacitance
C. Junction capacitance
D. Diffusion capacitance
25. The value of diffusion capacitance in pF x 10-4/µm2 in 2 µm design is?
A. 1.75
B. 4
C. 8
D. 16
26. The value of a standard unit of capacitance is?
A. 0.01pF
B. 0.0032pF
C. 0.0023pF
D. All of the mentioned
27. The standard unit of capacitance is defined as?
A. Capacitance of gate to channel of MOS transistor having W = L dimensions
B. Capacitance of gate to channel of n-MOS transistor having W = 3L dimensions
C. Capacitance of gate to channel of p-MOS transistor having 3W = L dimensions
D. Capacitance of gate to channel of n-MOS transistor having W = L dimensions and p-MOS having W=3L dimensions
28. The capacitances in MOSFET occurs due to _____________
A. Interconnects
B. Difference in Doping concentration
C. Difference in dopant materials
D. All of the mentioned
29. The parasitic capacitances found in MOSFET are ___________
A. Oxide related capacitances
B. Inter electrode capacitance
C. Electrolytic capacitance
D. All of the mentioned
30. The capacitance that exists between Gate and Bulk is called ___________
A. Oxide parasitic capacitance
B. Metal oxide capacitance
C. MOS capacitance
D. None of the mentioned